A year ago we reported on Intel’s nifty technique for 22nm chip fabrication, which may extend the life of Moore’s Law. Now MIT is reporting a new technique for optical lithography which should make 12nm chip manufacture possible, making for smaller, denser future chip tech.
By combining laser interference technology with a new “scanning beam” wafer technique, the team at the Space Nanotechnology Lab has demonstrated manufacturing of semiconductor wafers with 25nm detail. And it’s easily extendable to 12nm. In the scanning technique, Doppler shifts affect the laser’s ability to create accurate patterns, so the clever MIT guys synchronise the wafer under construction by oscillating the laser elements with 100Hz sound waves. Looks like that venerable old law will hold true for a while yet. [EETimes]